Ultra shallow ion implantation in GaAs and high temperature dopant activation using amorphous silicon caps

Ultra shallow ion implantation in GaAs and high temperature dopant activation using amorphous silicon caps

Siddiqui, Shahab

Electrical, computer, and systems engineering

December 2007

School of Engineering

Rensselaer Polytechnic Institute, Troy, NY

Dutta, Partha S.

2007-12

Electronic thesis

ENG

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