Investigation of surface treatment on the electrical interfacial properties of GaN MOS capacitors with Plasma-TEOS and LTO SiO2 as gate dielectrics

Investigation of surface treatment on the electrical interfacial properties of GaN MOS capacitors with Plasma-TEOS and LTO SiO2 as gate dielectrics

Tang, Ke

Electrical engineering

December 2008

School of Engineering

Center for Integrated Electronics

Rensselaer Polytechnic Institute, Troy, NY

Chow, Tat-Sing Paul

2008-12

Electronic thesis

ENG

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